Incorporating the CFI60 optical system, it supports both episcopic and diascopic illuminations and is ideal for metallurgical applications.
*Performs brightfield observation with brightness 3 times greater than conventional models
* Supports advanced microscopy with superior optical performance including longer working distances, minimum flare and high contrast
* Complete application of ergonomic design including its basic design that is SEMI compliant
* New large stage with a 151 x 100 mm cross travel capable of making diascopic observations of large-sized PCBs
* L-UEPI Universal Epi-illuminator ESD supports brightfield, darkfield, DIC, and simple polarizing observations